Our primary characterization tool is LSU's
J. Bennett Johnston, Sr. Center for Advanced Microstructures and Devices. CAMD is a 1.5 GeV electron storage ring and is our primary source for synchrotron radiation studies of surfaces.

Thin Film Growth

We grow films with a range of techniques, all conducted in uhv-compatible deposition side chambers with in situ transfer to analysis chambers.

• molecular-beam epitaxy is performed with e-beam heated wire evaporators that we design and construct in our laboratory
• plasma deposition is performed with magnetron guns and can be conducted in a reactive environment
• pulsed laser deposition allows us to deposit multicomponent materials with the same stoichiometry as the target. We use this for oxides and alloys.

Characterization

• Ellipsoidal-Mirror Analyzer allows us to image photoelectron angular distributions while retaining all polarization dependent information. This is particularly valuable in dichroism (MLD and MCD) studies of electronic structure
• Angle-Resolved Photoemission with Spin Detection
is performed with a miniature-Mott spin detector coupled to a 50 mm hemispherical analyzer mounted on a two-axis goniometer.
• Scanning Tunneling Microscopy (STM/AFM)
We are currently working to upgrade our STM facilities.
• Magneto-Optical Kerr Effect (MOKE)
is presently conducted ex-situ in an automated set-up to characterize magnetic properties of our films.

In addition to these primary tools, we have a complete surface characterization laboratory including LEED, ESDIAD, Auger, XPS, UPS, RHEED, MOKE and all the typical surface preparation tools.